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OPTIMIZED PROCESS FOR SILICON DEPOSITION

[Category : - CHEMISTRY]
[Viewed 83 times]

Field of the invention: silicon metal nanoparticles deposition as a material for lithium ion battery anode using inexpensive and safe precursor (trichlorosilane).

A process for converting trichlorosilane (HSiCl3) to silicon (Si) and tetrachlorosilane (SiCl4) comprising the following steps: (a) Disproportionation of trichlorosilane in the presence of a catalyst to obtain a mixture (I) comprising monosilane (SiH4), dichlorosilane (H2SiCI2), monochlorosilane (H3SiCI) and tetrachlorosilane, (b) Partial thermal decomposition of the mixture (I) obtained in step (a) at a temperature not exceeding 800°C to obtain silicon and a mixture (II) comprising unreacted tetrachlorosilane, wherein the molar ratio of the unreacted tetrachlorosilane to the obtained silicon is in the range 0.8:1 to 10:1. (c) Optional feeding of the mixture (II) obtained in step (b) in step (a) followed by repeating steps (a) and (b).

Patent publications:

WO 2024027952

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ipowner (Germany)

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